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Received: 2003-02-10

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Journal of Zhejiang University SCIENCE A 2004 Vol.5 No.2 P.198-205


Degradation kinetics and mechanisms of phenol in photo-Fenton process

Author(s):  HE Feng, LEI Le-cheng

Affiliation(s):  Department of Environmental Engineering, Zhejiang University, Hangzhou 310027, China

Corresponding email(s):   lclei@mail.hz.zj.cn

Key Words:  Phenol, Photo-Fenton process, Kinetics, Radical oxidation, Complex oxidation

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HE Feng, LEI Le-cheng. Degradation kinetics and mechanisms of phenol in photo-Fenton process[J]. Journal of Zhejiang University Science A, 2004, 5(2): 198-205.

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author="HE Feng, LEI Le-cheng",
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%DOI 10.1631/jzus.2004.0198

T1 - Degradation kinetics and mechanisms of phenol in photo-Fenton process
A1 - HE Feng
A1 - LEI Le-cheng
J0 - Journal of Zhejiang University Science A
VL - 5
IS - 2
SP - 198
EP - 205
%@ 1869-1951
Y1 - 2004
PB - Zhejiang University Press & Springer
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DOI - 10.1631/jzus.2004.0198

phenol degradation in photochemically enhanced Fenton process was investigated in this work. UV-VIS spectra of phenol degradation showed the difference between photo-Fenton process and UV/H2O2, which is a typical hydroxyl radical process. A possible pathway diagram for phenol degradation in photo-Fenton process was proposed, and a mathematical model for chemical oxygen demand (COD) removal was developed. Operating parameters such as dosage of H2O2 and ferrous ions, pH, suitable carrier gas were found to impact the removal of COD significantly. The results and analysis of kinetic parameters calculated from the kinetic model showed that complex degradation of phenol was the main pathway for removal of COD; while hydroxyl radicals acted weakly in the photo-Fenton degradation of phenol.

Darkslateblue:Affiliate; Royal Blue:Author; Turquoise:Article


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