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Frontiers of Information Technology & Electronic Engineering

ISSN 2095-9184 (print), ISSN 2095-9230 (online)

Multi-stage dual replica bit-line delay technique for process-variation-robust timing of low voltage SRAM sense amplifier

Abstract: A multi-stage dual replica bit-line delay (MDRBD) technique is proposed for reducing access time by suppressing the sense-amplifier enable (SAE) timing variation of low voltage static random-access memory (SRAM) applications. Compared with the traditional technique, this strategy, using statistical theory, reduces the timing variation by using multi-stage ideas, meanwhile doubling the replica bit-line (RBL) capacitance and discharge path simultaneously in each stage. At a supply voltage of 0.6 V, the simulation results show that the standard deviations of the SAE timing and cycle time with the proposed technique are 69.2% and 47.2%, respectively, smaller than that with a conventional RBL delay technique in TSMC 65 nm CMOS technology (Taiwan Semiconductor Manufacturing Company, Taiwan).

Key words: Process-variation-robust, Sense amplifier (SA), Replica bit-line (RBL) delay, Timing variation

Chinese Summary  <27> 用于低电压下SRAM灵敏放大器工艺变化鲁棒性时序的多级双复制位线延迟技术

目的:针对低电压下传统SRAM灵敏放大器控制时序受工艺、温度变化而引起的较大的控制时序的波动,设计一种基于多级双复制位线延迟技术的控制时序产生电路。
创新点:同时采用多级和双复制位线技术,充分发挥两者在降低控制时序变化方面的优点,取得整体上的改进。
方法:首先,分析现有复制位线延迟技术,从统计学角度对各技术之间的关系进行分析,进而提出一种基于多级双复制位线延迟技术的控制时序产生电路(图5)。然后,针对所提电路与现有技术在最差条件下进行蒙特卡洛仿真对比,得出所提技术在最差工作条件下,与现有技术相比具有更好的鲁棒性(图8)。最后在电压、工艺角以及温度分别变化时,对所提电路设计与现有的电路进行性能对比,得出在工艺、电压及温度变化时,所提电路具有更好的稳定性(图9-11)。
结论:针对低电压SRAM灵敏放大器控制时序在工艺、电压以及温度变化产生的波动,提出一种多级双复制位线延迟技术,实现进一步降低灵敏放大器控制时序波动的效果。

关键词组:工艺变化鲁棒性;灵敏放大器;复制位线延迟;时序变化


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DOI:

10.1631/FITEE.1400439

CLC number:

TN43

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On-line Access:

2015-08-04

Received:

2014-12-28

Revision Accepted:

2015-06-07

Crosschecked:

2015-07-20

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