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Abstract: We propose a general method of designing phase-shifting algorithms for grating lateral shearing interferometry. The algorithms compensate for the zeroth-order effect error and phase-shifting error in varying degrees. We derive a general expression of the phase-shifting algorithm in grating lateral shearing interferometer and introduce the corresponding design method. Based on the expression and method, four phase-shifting algorithms are designed with different phase-shifting errors to obtain high measurement accuracy. A new 13-frame phase-shifting algorithm is designed and simulated with a large zeroth-order effect. Simulation results verify the general expression and the corresponding design method.

一种用于抑制相移误差和零级串扰的相移算法通用设计方法

[1]Bai F, Wang X, Huang K, et al., 2013. Analysis of spatial resolution and pinhole size for single-shot point-diffraction interferometer using in closed-loop adaptive optics. Opt Commun, 297:27-31.

[2]Bueno JM, Acosta E, Schwarz C, et al., 2010. Wavefront measurements of phase plates combining a point-diffraction interferometer and a Hartmann-Shack sensor. Appl Opt, 49(3):450-456.

[3]Dai F, Li J, Wang X, et al., 2016. Exact two-dimensional zonal wavefront reconstruction with high spatial resolution in lateral shearing interferometry. Opt Commun, 367:264-273.

[4]Fang C, Xiang Y, Qi K, et al., 2013. An 11-frame phase shifting algorithm in lateral shearing interferometry. Opt Expr, 21(23):28325-28333.

[5]Fujii T, Kougo J, Mizuno Y, et al., 2003. Portable phase measuring interferometer using Shack-Hartmann method. Proc SPIE, 5038:726-732.

[6]Gao P, Harder I, Nercissian V, et al., 2010. Phase-shifting point-diffraction interferometry with common-path and in-line configuration for microscopy. Opt Lett, 35(5):712-714.

[7]Goldberg KA, Naulleau P, Denham P, et al., 2004. EUV interferometric testing and alignment of the 0.3-NA MET optic. Proc SPIE, 5374:64-73.

[8]Hasegawa M, Ouchi C, Hasegawa T, et al., 2004. Recent progress of EUV wave-front metrology in EUVA. Proc SPIE, 5533:27-36.

[9]Hasegawa T, Ouchi C, Hasegawa M, et al., 2004. EUV wavefront metrology system in EUVA. Proc SPIE, 5374:797-807.

[10]Lee SH, Naulleau P, Goldberg KA, et al., 2000. Phase-shifting point-diffraction interferometry at 193 nm. Appl Opt, 39(31):5768-5772.

[11]Li J, Gong Y, Chen H, et al., 2015. Wave-front reconstruction with Hartmann-Shack sensor using a phase-retrieval method. Opt Commun, 336:127-133.

[12]Miyakawa R, Naulleau P, Goldberg K, 2009. Analysis of systematic errors in lateral shearing interferometry for EUV optical testing. Proc SPIE, 7272:72721V.

[13]Schreiber H, Schwider J, 1997. Lateral shearing interferometer based on two Ronchi gratings in series. Appl Opt, 36(22): 5321-5324.

[14]Takeda M, Kobayashi S, 1984. Lateral aberration measurements with a digital Talbot interferometer. Appl Opt, 23(11):1760-1764.

[15]Wang F, Wang X, Ma M, et al., 2006. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask. Appl Opt, 45(2):281-287.

[16]Zhu Y, Gemma T, 2001. Method for designing error-compensating phase-calculation algorithms for phase-shifting interferometry. Appl Opt, 40(25):4540-4546.

[17]Zhu Y, Sugisakia K, Ouchia C, et al., 2004. Lateral shearing interferometer for EUVL: theoretical analysis and experiment. Proc SPIE, 5374:824-832.

[18]Zhu Y, Sugisaki K, Okada, M, et al., 2007. Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Appl Opt, 46(27):6783-6792.