
CLC number: O47; O64
On-line Access: 2024-08-27
Received: 2023-10-17
Revision Accepted: 2024-05-08
Crosschecked: 2018-04-11
Cited: 0
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Jing-yu Qu, Zheng-fei Guo, Kun Pan, Wei-wei Zhang, Xue-jin Wang. Influence of annealing conditions on the properties of Cu(In,Ga)Se2 thin films fabricated by electrodeposition[J]. Journal of Zhejiang University Science A,in press.Frontiers of Information Technology & Electronic Engineering,in press.https://doi.org/10.1631/jzus.A1700261 @article{title="Influence of annealing conditions on the properties of Cu(In,Ga)Se2 thin films fabricated by electrodeposition", %0 Journal Article TY - JOUR
退火条件对电沉积制备铜铟镓硒薄膜品质的影响创新点:目前利用水溶液电沉积制备的铜铟镓硒薄膜太阳能电池转换效率不高,而退火是制作此电池的关键步骤之一。本文研究了退火温度和升温速率对薄膜品质的影响,分析其可能原因及退火过程发生的反应,并制备出了理想的高品质薄膜。 方法:1. 在水溶液中利用电沉积法制备出铜铟镓硒薄膜前驱体。2. 对前驱体进行退火处理,并针对不同的样品采用不同的退火温度和升温速率。3. 利用X射线衍射(XRD)、拉曼光谱(Raman)、扫描电子显微镜(SEM)、X射线荧光光谱(XRF)对薄膜进行表征,分析不同退火条件对结果的影响规律。 结论:1. 退火温度的影响:退火温度由450 °C升高到 580 °C时,得到的薄膜结晶性越来越好,晶粒边界越来越不明显,Cu/(In+Ga)的比例逐渐升高,说明高温下(≥450 °C)金属铟和镓较易挥发;实验中还发现Cu-Se化合物的总含量随退火温度的升高而降低。2. 升温速率的影响:退火速率越高,薄膜结晶性越好;快速升温时薄膜中Cu/(In+Ga)的比例略低于慢速升温时的样品,而Ga/(In+Ga)的比例几乎不变,说明快速升温可以减少In和Ga的挥发。 关键词组: Darkslateblue:Affiliate; Royal Blue:Author; Turquoise:Article
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