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index	Title
1	Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process Author(s):Jiao-jiao Zhu, Xiao-hua Luo, Li-sh...  Clicked:7279  Download:3833  Cited:1  <Full Text> Journal of Zhejiang University Science C  2012 Vol.13 No.5 P.376-384  DOI:10.1631/jzus.C1100242

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