| index | Title |
| 1 | Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process Author(s):Jiao-jiao Zhu, Xiao-hua Luo, Li-sh... Clicked:8835 Download:4771 Cited:1 <Full Text> Journal of Zhejiang University Science C 2012 Vol.13 No.5 P.376-384 DOI:10.1631/jzus.C1100242 |