CLC number: TP391.7
On-line Access: 2024-08-27
Received: 2023-10-17
Revision Accepted: 2024-05-08
Crosschecked: 0000-00-00
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LI Jian-hua, LIU Yu-sheng, GAO Shu-ming. Mask synthesis and verification based on geometric model for surface micro-machined MEMS[J]. Journal of Zhejiang University Science A, 2005, 6(9): 1007-1010.
@article{title="Mask synthesis and verification based on geometric model for surface micro-machined MEMS",
author="LI Jian-hua, LIU Yu-sheng, GAO Shu-ming",
journal="Journal of Zhejiang University Science A",
volume="6",
number="9",
pages="1007-1010",
year="2005",
publisher="Zhejiang University Press & Springer",
doi="10.1631/jzus.2005.A1007"
}
%0 Journal Article
%T Mask synthesis and verification based on geometric model for surface micro-machined MEMS
%A LI Jian-hua
%A LIU Yu-sheng
%A GAO Shu-ming
%J Journal of Zhejiang University SCIENCE A
%V 6
%N 9
%P 1007-1010
%@ 1673-565X
%D 2005
%I Zhejiang University Press & Springer
%DOI 10.1631/jzus.2005.A1007
TY - JOUR
T1 - Mask synthesis and verification based on geometric model for surface micro-machined MEMS
A1 - LI Jian-hua
A1 - LIU Yu-sheng
A1 - GAO Shu-ming
J0 - Journal of Zhejiang University Science A
VL - 6
IS - 9
SP - 1007
EP - 1010
%@ 1673-565X
Y1 - 2005
PB - Zhejiang University Press & Springer
ER -
DOI - 10.1631/jzus.2005.A1007
Abstract: Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.
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