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CLC number: TP391.7
On-line Access: 2024-08-27
Received: 2023-10-17
Revision Accepted: 2024-05-08
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Mask synthesis and verification based on geometric model for surface micro-machined MEMS
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LI Jian-hua, LIU Yu-sheng, GAO Shu-ming. Mask synthesis and verification based on geometric model for surface micro-machined MEMS[J]. Journal of Zhejiang University Science A, 2005, 6(9): 1007-1010.
@article{title="Mask synthesis and verification based on geometric model for surface micro-machined MEMS",
author="LI Jian-hua, LIU Yu-sheng, GAO Shu-ming",
journal="Journal of Zhejiang University Science A",
volume="6",
number="9",
pages="1007-1010",
year="2005",
publisher="Zhejiang University Press & Springer",
doi="10.1631/jzus.2005.A1007"
}
%0 Journal Article
%T Mask synthesis and verification based on geometric model for surface micro-machined MEMS
%A LI Jian-hua
%A LIU Yu-sheng
%A GAO Shu-ming
%J Journal of Zhejiang University SCIENCE A
%V 6
%N 9
%P 1007-1010
%@ 1673-565X
%D 2005
%I Zhejiang University Press & Springer
%DOI 10.1631/jzus.2005.A1007
TY - JOUR
T1 - Mask synthesis and verification based on geometric model for surface micro-machined MEMS
A1 - LI Jian-hua
A1 - LIU Yu-sheng
A1 - GAO Shu-ming
J0 - Journal of Zhejiang University Science A
VL - 6
IS - 9
SP - 1007
EP - 1010
%@ 1673-565X
Y1 - 2005
PB - Zhejiang University Press & Springer
ER -
DOI - 10.1631/jzus.2005.A1007
Abstract: Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.
[1] Ananthakrishnan, V., Sarma, R., Ananthasuresh, G.K., 2003. Systematic mask synthesis for surface micromachined microelectromechanical systems. Journal of Micromechanics and Microengineering, 13(6):927-941.
[2] Antonsson, E.K., 1996. Structured Design Methods for MEMS. NSF MEMS Workshop Final Report, California Institute of Technology.
[3] Dixit, H., Kannapan, S., Taylor, D.L., 1997. 3D Geometric Simulation of MEMS Fabrication Processes: A Semantic Approach. Proceedings of the 4th ACM Symposium on Solid Modeling and Applications, p.376-387.
[4] Gao, F., 2004. A Feature-Based Geometric Modeling Approach for Surface Micromachined Micro-Mechanical Systems. Ph.D Thesis, The University of Toledo, Toledo.
[5] Li, J.H., Gao, S.M., Liu, Y.S., 2005. Feature-based process layer modeling for surface micro-machined MEMS. Journal of Micromechanics and Microengineering, 15(3):620-635.
[6] Koester, D., Cowen, A., Mahadevan, R., Stonefield, M., Hardy, B., 2002. PolyMUMPs Design Handbook Revision 10.0. MEMSCAP Inc., Durham.
[7] Koppelman, G.M., 1989. OYSTER, a three dimensional structure simulator for micro electro-mechanical design. Sensors and Actuators, 20:179-185.
[8] Osterberg, P.M., Senturia, S.D., 1995. “MemBuilder”: An Automated 3D Solid Model Construction Program for Microelectromechanical Structures. Proceeding of the 8th International Conference on Solid-State Sensors and Actuators, and EuroSensors IX, Stockholm, Sweden, 1:21-24.
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